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Thin-film growth of (110) rutile TiO2on (100) Ge substrate by pulsed laser deposition
(Thin-film growth of (110) rutile TiO2 on (100) Ge substrate by pulsed laser deposition)

Yoshihisa Suzuki, Takahiro Nagata, Yoshiyuki Yamashita, Toshihide Nabatame, Atsushi Ogura, Toyohiro Chikyow.
Japanese Journal of Applied Physics 55 [6S1] 06GG06. 2016.
https://doi.org/10.7567/jjap.55.06gg06

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    作成時刻: 2016-07-11 14:07:41 +0900更新時刻: 2024-04-01 23:25:42 +0900

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