HOME > 論文 > 書誌詳細Ge incorporated epitaxy of (110) rutile TiO2 on (100) Ge single crystal at low temperature by pulsed laser depositionTakahiro Nagata, Kazuyoshi Kobashi, Yoshiyuki Yamashita, Hideki Yoshikawa, Chinnamuthu Paulsamy, Yoshihisa Suzuki, Toshihide Nabatame, Atsushi Ogura, Toyohiro Chikyow. Thin Solid Films 591 105-110. 2015.https://doi.org/10.1016/j.tsf.2015.08.031 NIMS著者長田 貴弘山下 良之吉川 英樹生田目 俊秀知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻 :2016-05-24 17:56:58 +0900 更新時刻 :2020-11-16 22:32:03 +0900