HOME > 論文 > 書誌詳細Effects of oxidant gas for atomic layer deposition on crystal structure and fatigue of ferroelectric HfxZr1−xO2 thin filmsTakashi Onaya, Toshihide Nabatame, Takahiro Nagata, Kazuhito Tsukagoshi, Jiyoung Kim, Chang-Yong Nam, Esther H.R. Tsai, Koji Kita. Solid-State Electronics 210 108801. 2023.https://doi.org/10.1016/j.sse.2023.108801 NIMS著者生田目 俊秀長田 貴弘塚越 一仁Materials Data Repository (MDR)上の本文・データセット作成時刻: 2023-11-03 03:13:27 +0900更新時刻: 2024-05-01 09:59:54 +0900
