HOME > 会議録 > 書誌詳細Role of Oxygen in Hf-based High-k Gate Stacks on Vfb Shifts(Hf-酸化物ゲートスタックのＶｆｂシフトへ及ぼす酸素の役割)Toshihide Nabatame, Akihiko Ohi, Toyohiro Chikyow. Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference . 2010.https://doi.org/10.1109/icsict.2010.5667509 NIMS著者生田目 俊秀大井 暁彦知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:54:37 +0900更新時刻: 2024-04-01 22:25:10 +0900
