HOME > Presentation > Detail(Atomic Layer Deposited HfO2/Al2O3 Multi-nano-layer on Diamond for Field Effect Transistor)劉 江偉, 廖 梅勇, 井村 将隆, 小出 康夫. The 4th Annual World Congress of Nano-S&T. October 29, 2014-October 31, 2014.NIMS author(s)LIU, JiangweiLIAO, MeiyongIMURA, MasatakaFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 03:35:53 +0900 Updated at: 2017-07-10 21:57:44 +0900