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Ge上ルチル型TiO2成膜条件の最適化の検討
(Thin film growth of (110) RutileTiO2 on (100) Ge Substrate by Pulsed Laser Deposition)
28th International Microprocesses and Nanotechnology Conference. 2015.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:00:46 +0900Updated at: 2017-07-10 22:17:31 +0900