HOME > Presentation > DetailAtomic Layer Deposited High-k Insulators on Hydrogenated-diamond for Field Effect Transistors劉 江偉, 廖 梅勇, 井村 将隆, 小出 康夫. MANA International Symposium 2015. March 11, 2015-March 13, 2015.NIMS author(s)LIU, JiangweiLIAO, MeiyongIMURA, MasatakaFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:04:28 +0900 Updated at: 2017-07-10 22:04:59 +0900