HOME > Presentation > Detail(Study on oxygen and metal migration at Pt or Cu/HfO2 interfaces under bias operation for oxide based ReRAM application)長田 貴弘, 南風盛 将光, 山下 良之, 吉川 英樹, 小林 啓介, 知京 豊裕. The Seventh International Nanotechnology Conference on Communic. 2011.NIMS author(s)NAGATA, TakahiroYAMASHITA, YoshiyukiYOSHIKAWA, HidekiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:22:40 +0900Updated at: 2017-07-10 21:04:37 +0900