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O2+およびAr+イオン注入後のSiナノワイヤ内部の結晶性回復過程
(Re-crystallization process in SiNWs implanted with O2+ and Ar+ ions)
春季第56回応用物理学会学術講演会. March 30, 2009-April 01, 2009.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 05:44:53 +0900 Updated at: 2017-07-10 20:28:55 +0900