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TMA原料によるRutile-TiO2膜への酸素欠損の導入とその電気特性
(Oxygen vacancy into Rutile-TiO2 films introduced by TMA-ALD process and its electrical properties)
日本金属学会 2014年秋季講演大会. September 24, 2014-September 26, 2014.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:14:47 +0900 Updated at: 2017-07-10 21:55:42 +0900