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著者名NAGATA, Takahiro, SOMU, Kumaragurubaran, TSUNEKAWA, Yoshifumi, YAMASHITA, Yoshiyuki, UEDA, Shigenori, TAKAHASHI, Kenichiro, RI, Sunggi, SUZUKI, Setsu, OH, Seungjun, CHIKYOW, Toyohiro.
タイトルInterface stability of electrode/Bi-contained relaxor ferroelectric oxide stack struc-ture for high temperature operational capacitor
会議名28th International Microprocesses and Nanotechnology Conference
発表年2015
言語English
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