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AuthorNAGATA, Takahiro, SOMU, Kumaragurubaran, TSUNEKAWA, Yoshifumi, YAMASHITA, Yoshiyuki, UEDA, Shigenori, TAKAHASHI, Kenichiro, RI, Sunggi, SUZUKI, Setsu, OH, Seungjun, CHIKYOW, Toyohiro.
TitleInterface stability of electrode/Bi-contained relaxor ferroelectric oxide stack struc-ture for high temperature operational capacitor
Event name28th International Microprocesses and Nanotechnology Conference
Year of publication2015
LanguageEnglish
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