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Interface stability of electrode/Bi-contained relaxor ferroelectric oxide stack struc-ture for high temperature operational capacitor
28th International Microprocesses and Nanotechnology Conference . 2015.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 10:57:12 +0900Updated at: 2017-07-10 22:14:34 +0900