SAMURAI - NIMS Researchers Database

HOME > Presentation > Detail

Interface stability of electrode/Bi-contained relaxor ferroelectric oxide stack struc-ture for high temperature operational capacitor

長田 貴弘, ソム クマラグルバラン, 恒川 吉文, 山下 良之, 上田 茂典, 高橋 健一郎, 李 成奇, 鈴木 摂, オウ セウンジン, 知京 豊裕.
28th International Microprocesses and Nanotechnology Conference . November 10, 2015-November 13, 2015.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-02-14 10:57:12 +0900 Updated at: 2017-07-10 22:14:34 +0900

    ▲ Go to the top of this page