Ferroelectric HfxZr1−xO2-based capacitors with controlled-oxidation surface of TiN bottom-electrode

ONAYA, Takashi, NABATAME, Toshihide, Yukinori Morita, Hiroyuki Ota, Shinji Migita, Koji Kita, NAGATA, Takahiro, TSUKAGOSHI, Kazuhito, Takashi Matsukawa.

MNC 2022, 35th International Microprocesses and Nanotechnology Conference. 2022年11月08日-2022年11月11日.

作成時刻: 2022-12-02 03:39:49 +0900更新時刻: 2022-12-02 03:39:49 +0900