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Ferroelectric HfxZr1−xO2-based capacitors with controlled-oxidation surface of TiN bottom-electrode

ONAYA, Takashi, NABATAME, Toshihide, Yukinori Morita, Hiroyuki Ota, Shinji Migita, Koji Kita, NAGATA, Takahiro, TSUKAGOSHI, Kazuhito, Takashi Matsukawa.
MNC 2022, 35th International Microprocesses and Nanotechnology Conference. 2022.

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Materials Data Repository (MDR)上の本文・データセット

    作成時刻: 2022-12-02 03:39:49 +0900更新時刻: 2022-12-02 03:39:49 +0900

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