Improvement of leakage current properties of ZrO2/(Ta/Nb)Ox-Al2O3/ZrO2 nano-laminate insulating stacks for DRAM capacitor
16th International Conference on Atomic Layer Deposition. 2016.
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作成時刻: 2017-01-08 04:51:43 +0900更新時刻: 2017-07-10 22:22:24 +0900