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(Characterization of High-k Gate Stacks by EBIC Technique)

陳 君, 関口 隆史, 深田 直樹, 佐藤基之, 高瀬 雅美, 蓮沼隆, 山部紀久夫, 山田啓作, 知京 豊裕.
International Nanotechnology Conference on Communication and Coo. 2011.

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    Created at: 2017-01-08 04:48:20 +0900Updated at: 2017-07-10 21:04:14 +0900

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