HOME > Presentation > Detail(Characterization of High-k Gate Stacks by EBIC Technique)陳 君, 関口 隆史, 深田 直樹, 佐藤基之, 高瀬 雅美, 蓮沼隆, 山部紀久夫, 山田啓作, 知京 豊裕. International Nanotechnology Conference on Communication and Coo. 2011.NIMS author(s)CHEN, JunFUKATA, NaokiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:48:20 +0900Updated at: 2017-07-10 21:04:14 +0900