HOME > Presentation > Detail(Characterization of High-k Gate Stacks by EBIC Technique)陳 君, 関口 隆史, 深田 直樹, 佐藤基之, 高瀬 雅美, 蓮沼隆, 山部紀久夫, 山田啓作, 知京 豊裕. International Nanotechnology Conference on Communication and Coo. May 16, 2011-May 19, 2011.NIMS author(s)CHEN, JunFUKATA, NaokiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:48:20 +0900 Updated at: 2017-07-10 21:04:14 +0900