| 49708件の論文が見つかりました。論文は出版年月日順に表示しています。（ヘルプ） | |
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| M. Tagawa, T. Kawasaki, C. Oshima, S. Otani, K. Edamoto, A. Nagashima. TMC(100) surface relaxation studied with low-energy-electron-diffraction intensity. Surface Science. 517 [1-3] (2002) 59-64 10.1016/s0039-6028(02)01913-1 | |
| H Kitaoka, K Ozawa, K Edamoto, S Otani. Interaction of water and methanol with oxygen-modified ZrC(100) surfaces. Surface Science. 518 [3] (2002) 225-233 10.1016/s0039-6028(02)02163-5 | |
| CY. Chan, WJ. Zhang, MATSUMOTO, Seiichiro, I. Bello, ST. Lee. A Nanoindentation study of thick cBN films prepared by chemical vapor deposition. JOURNAL OF CRYSTAL GROWTH. 247 [2] (2002) 438-444 | |
| 黒田 聖治. 溶射粒子の状態計測. 溶射. 39 [2] (2002) 72-78 | |
| T. Fukuzaki, T. Takeuchi, N. Banno, N. Tatsumi, K. Itoh, H. Ogiwara, H. Wada. Stress and Strain effects of Nb3Al conductors subjected to different heat treatment. IEEE Transactions on Appiled Superconductivity. 12 [1] (2002) 1025-1028 10.1109/tasc.2002.1018575 | |
| 太刀川恭治, T. Kato, H. Matsumoto, R. Kato, M. Aodai, TAKEUCHI, Takao. Optimization of processing parameter of (Nb,Ta)3Sn superconductors with Ta-Sn core. ADVANCED ENGINEERING MATERIALS. 48 (2002) 917-924 | |
| T. Takeuchi. Nb3Al Superconductors. IEEE Transactions on Appiled Superconductivity. 12 [1] (2002) 1088-1093 10.1109/tasc.2002.1018590 | |
| N. Harada, T. Nakano, M. Tsuda, T. Hamajima, F. Buta, E. Lee, M.D. Sumption, E.W. Collings, K. Tagawa, H. Moriai, T. Takeuchi, H. Wada, K. Watanabe. Influence of rapid heating condition on superconducting properties in transformed jelly-roll Nb3Al multifilamentary wire. IEEE Transactions on Appiled Superconductivity. 12 [1] (2002) 1033-1036 10.1109/tasc.2002.1018492 | |
| Yasuo Iijima, Akihiro Kikuchi, Kiyoshi Inoue. Cu-additional effects on RHQ-processed Nb3Al multifilamentary superconductors. Physica C: Superconductivity. 372-376 (2002) 1303-1306 10.1016/s0921-4534(02)01015-8 | |
| X. Jiang, K. Helming, WJ. Zhang, MATSUMOTO, Seiichiro. Growth Characteristics and Texture of Cubic Boron Nitride Films Produced by CVD. Chemical Vapor Deposition. 8 [6] (2002) 262-265 10.1002/1521-3862(20021203)8:6<262::aid-cvde262>3.0.co;2-w | |
