Reproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Reproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method
(動的Shirley法によるSiO2/Si薄膜のXPS膜厚解析の再現性)

Ryo Matsumoto, Yugo Nishizawa, Noriyuki Kataoka, Hiromi Tanaka, Hideki Yoshikawa, Shigeo Tanuma, Kazuhiro Yoshihara.

Journal of Electron Spectroscopy and Related Phenomena 207 55-59. 2016.

https://doi.org/10.1016/j.elspec.2015.12.008

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Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 18:07:03 +0900更新時刻: 2024-04-01 18:55:40 +0900

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