Reproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method | SAMURAI, NIMS Researchers Directory Service

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Reproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method
(動的Shirley法によるSiO2/Si薄膜のXPS膜厚解析の再現性)

Ryo Matsumoto, Yugo Nishizawa, Noriyuki Kataoka, Hiromi Tanaka, Hideki Yoshikawa, Shigeo Tanuma, Kazuhiro Yoshihara.

Journal of Electron Spectroscopy and Related Phenomena 207 55-59. 2016.

https://doi.org/10.1016/j.elspec.2015.12.008

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 18:07:03 +0900 Updated at: 2026-11-01 05:30:30 +0900

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