HOME > Article > DetailReproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method(動的Shirley法によるSiO2/Si薄膜のXPS膜厚解析の再現性)Ryo Matsumoto, Yugo Nishizawa, Noriyuki Kataoka, Hiromi Tanaka, Hideki Yoshikawa, Shigeo Tanuma, Kazuhiro Yoshihara. Journal of Electron Spectroscopy and Related Phenomena 207 55-59. 2016.https://doi.org/10.1016/j.elspec.2015.12.008 NIMS author(s)MATSUMOTO, RyoYOSHIKAWA, HidekiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 18:07:03 +0900Updated at: 2024-05-02 05:42:01 +0900