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Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers
(Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers)

ACS Photonics 2 [7] 964-970. 2015.

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    作成時刻: 2016-05-24 17:52:55 +0900更新時刻: 2024-06-03 05:00:18 +0900

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