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Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers
(Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers)

Thang Duy Dao, Kai Chen, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Masahiro Kitajima, Tadaaki Nagao.
ACS Photonics 2 [7] 964-970. 2015.
https://doi.org/10.1021/acsphotonics.5b00195

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    作成時刻: 2016-05-24 17:52:55 +0900更新時刻: 2024-04-01 18:13:15 +0900

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