HOME > Article > DetailInfrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers(Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al–Al2O3–Al Trilayers)Thang Duy Dao, Kai Chen, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Masahiro Kitajima, Tadaaki Nagao. ACS Photonics 2 [7] 964-970. 2015.https://doi.org/10.1021/acsphotonics.5b00195 NIMS author(s)ISHII, SatoshiOHI, AkihikoNABATAME, ToshihideNAGAO, TadaakiFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2016-05-24 17:52:55 +0900 Updated at :2024-03-29 18:28:30 +0900