HOME > 論文 > 書誌詳細Electrical property improvement for boron-doped diamond metal–oxide–semiconductor field-effect transistorsJ. W. Liu, T. Teraji, B. Da, Y. Koide. Applied Physics Letters 124 [7] 072103. 2024.https://doi.org/10.1063/5.0194424 Open Access AIP Publishing (Publisher) Materials Data Repository (MDR) NIMS著者劉 江偉寺地 徳之Materials Data Repository (MDR)上の本文・データセットMDRavailable Electrical property improvement for boron-doped diamond metal–oxide–semiconductor field-effect transistors 作成時刻: 2024-02-16 03:11:40 +0900 更新時刻: 2026-10-08 09:01:41 +0900
