HOME > 論文 > 書誌詳細Formation Mechanism of Interstitial Hydrogen Molecules in Crystalline SiliconKunie Ishioka, Naomasa Umehara, Sin-ya Fukuda, Toshiki Mori, Shun-ichi Hishita, Isao Sakaguchi, Hajime Haneda, Masahiro Kitajima, Kouichi Murakami. Japanese Journal of Applied Physics 42 [Part 1, No. 9A] 5410-5414. 2003.https://doi.org/10.1143/jjap.42.5410 NIMS著者石岡 邦江菱田 俊一坂口 勲羽田 肇Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 11:56:16 +0900更新時刻: 2024-04-01 23:18:53 +0900
