HOME > Article > DetailFormation Mechanism of Interstitial Hydrogen Molecules in Crystalline SiliconKunie Ishioka, Naomasa Umehara, Sin-ya Fukuda, Toshiki Mori, Shun-ichi Hishita, Isao Sakaguchi, Hajime Haneda, Masahiro Kitajima, Kouichi Murakami. Japanese Journal of Applied Physics 42 [Part 1, No. 9A] 5410-5414. 2003.https://doi.org/10.1143/jjap.42.5410 NIMS author(s)ISHIOKA, KunieSAKAGUCHI, IsaoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 11:56:16 +0900 Updated at: 2026-11-04 05:48:02 +0900
