HOME > 論文 > 書誌詳細GaN Film Fabrication by Near-Atmospheric Plasma-Assisted Chemical Vapor DepositionTakahiro Nagata, Yoshiki Sakuma, Tsuyoshi Uehara, Toyohiro Chikyow. Japanese Journal of Applied Physics 46 [No. 2] L43-L45. 2007.https://doi.org/10.1143/jjap.46.l43 NIMS著者長田 貴弘佐久間 芳樹知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:08:42 +0900 更新時刻: 2026-09-29 04:31:42 +0900
