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Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis

著者Takashi Onaya, Toshihide Nabatame, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison Sejoon Kim, Naomi Sawamoto, Chang-Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Jiyoung Kim, Atsushi Ogura.
掲載誌名APL Materials 9 [3] 031111
ISSN: 2166532X
ESIでのカテゴリ: MATERIALS SCIENCE
出版社AIP Publishing
発表年2021
言語English
DOIhttps://doi.org/10.1063/5.0035848
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