Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis

Takashi Onaya; Toshihide Nabatame; Yong Chan Jung; Heber Hernandez-Arriaga; Jaidah Mohan; Harrison Sejoon Kim; Naomi Sawamoto; Chang-Yong Nam; Esther H. R. Tsai; Takahiro Nagata; Jiyoung Kim; Atsushi Ogura; Takashi Onaya; Toshihide Nabatame; Yong Chan Jung; Heber Hernandez-Arriaga; Jaidah Mohan; Harrison Sejoon Kim; Naomi Sawamoto; Chang-Yong Nam; Esther H. R. Tsai; Takahiro Nagata; Jiyoung Kim; Atsushi Ogura

doi:10.1063/5.0035848

Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis

Takashi Onaya, Toshihide Nabatame, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison Sejoon Kim, Naomi Sawamoto, Chang-Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Jiyoung Kim, Atsushi Ogura.

APL Materials 9 [3] 031111. 2021.

https://doi.org/10.1063/5.0035848

Open Access AIP Publishing (Publisher)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2021-04-16 03:00:17 +0900Updated at: 2024-03-31 12:51:45 +0900