HOME > 論文 > 書誌詳細Effect of reactive gas condition on nonpolar AlN film growth on MnS/Si (100) by reactive DC sputteringMasaya Morita, Keiji Ishibashi, Kenichiro Takahashi, Shigenori Ueda, Jun Chen, Kota Tatejima, Toyohiro Chikyow, Atsushi Ogura, Takahiro Nagata. Japanese Journal of Applied Physics 61 [SC] SC1071. 2022.https://doi.org/10.35848/1347-4065/ac4ad7 NIMS著者上田 茂典陳 君立島 滉大知京 豊裕長田 貴弘Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-09-07 03:24:30 +0900更新時刻: 2024-04-02 05:36:24 +0900
