Scalable growth of atomically thin MoS2 layers in a conventional MOCVD system using molybdenum dichloride dioxide as the molybdenum source | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Scalable growth of atomically thin MoS2 layers in a conventional MOCVD system using molybdenum dichloride dioxide as the molybdenum source

Xu Yang, Shisheng Li, Naoki Ikeda, Akihiro Ohtake, Yoshiki Sakuma.

Applied Surface Science 636 157756. 2023.

https://doi.org/10.1016/j.apsusc.2023.157756

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作成時刻: 2023-09-06 03:55:10 +0900更新時刻: 2024-04-02 07:18:26 +0900

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