HOME > Proceedings > Detail
Y2O3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma
(二段階プロセスで作製したY2O3薄膜とそのハロゲンプラズマ耐性)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-27 01:34:27 +0900 Updated at: 2017-03-17 03:36:38 +0900