Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics:First-Principles Investigation

Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics:First-Principles Investigation
(低誘電率材料のための、炭素含有量が多く炭化水素ネットワーク結合を有するＳｉOCH膜：第一原理的研究)

TAJIMA, Nobuo, OHNO, Takahisa, HAMADA, Tomoyuki, YONEDAKatsumi, KOBAYASHINobuyoshi, SHINRIKIManabu, MIYAZAWAKazuhiro, SAKOTAKaoru, HASAKASatoshi, INOUEMinoru.

Proceeding of the 2006 International Interconnect Technology Conference 122-125. 2006.

NIMS author(s)

TAJIMA, Nobuo

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2017-02-27 01:04:55 +0900 Updated at: 2017-03-17 03:04:50 +0900

Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics:First-Principles Investigation(低誘電率材料のための、炭素含有量が多く炭化水素ネットワーク結合を有するＳｉOCH膜：第一原理的研究)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics:First-Principles Investigation
(低誘電率材料のための、炭素含有量が多く炭化水素ネットワーク結合を有するＳｉOCH膜：第一原理的研究)