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Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics:First-Principles Investigation
(低誘電率材料のための、炭素含有量が多く炭化水素ネットワーク結合を有するSiOCH膜:第一原理的研究)

TAJIMA, Nobuo, OHNO, Takahisa, HAMADA, Tomoyuki, YONEDAKatsumi, KOBAYASHINobuyoshi, SHINRIKIManabu, MIYAZAWAKazuhiro, SAKOTAKaoru, HASAKASatoshi, INOUEMinoru.

NIMS author(s)


    Fulltext and dataset(s) on Materials Data Repository (MDR)


      Created at: 2017-02-27 01:04:55 +0900Updated at: 2017-03-17 03:04:50 +0900

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