HOME > 会議録 > 書誌詳細Nitrogen Incorporation in Hf-based High-k Dielectrics: Reduction in Electron ChargeUMEZAWA, Naoto, SHIRAISHI, Kenji, 鳥居和功, Mauro Boero, CHIKYOW, Toyohiro, WATANABE, Heiji, YAMABE, Kikuo, OHNO, Takahisa, YAMADA, Keisaku, 奈良安雄, YAMADA Keisaku. PROCEEDINGS OF ESSDERC 2005 201-204. 2005.NIMS著者知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 00:53:57 +0900更新時刻: 2017-03-17 02:54:25 +0900
