SAMURAI - NIMS Researchers Database

HOME > Proceedings > Detail

Nitrogen Incorporation in Hf-based High-k Dielectrics: Reduction in Electron Charge

UMEZAWA, Naoto, SHIRAISHI, Kenji, 鳥居和功, Mauro Boero, CHIKYOW, Toyohiro, WATANABE, Heiji, YAMABE, Kikuo, OHNO, Takahisa, YAMADA, Keisaku, 奈良安雄, YAMADA Keisaku.
PROCEEDINGS OF ESSDERC 2005 201-204. 2005.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2017-02-27 00:53:57 +0900Updated at: 2017-03-17 02:54:25 +0900

    ▲ Go to the top of this page