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Effect of indentation and annealing on 2 MeV Cu ion-implanted SiO2

PAN, Jin, Haisong, Wang, TAKEDA, Yoshihiko, UMEDA, Naoki, KONO, Kenichiro, AMEKURA, Hiroshi, KISHIMOTO, Naoki.

Proceeding of ISSP 2007 17-20. 2007.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2017-02-27 01:17:03 +0900 Updated at: 2017-03-17 03:16:31 +0900

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