HOME > 会議録 > 書誌詳細Effect of indentation and annealing on 2 MeV Cu ion-implanted SiO2PAN, Jin, Haisong, Wang, TAKEDA, Yoshihiko, UMEDA, Naoki, KONO, Kenichiro, AMEKURA, Hiroshi, KISHIMOTO, Naoki. Proceeding of ISSP 2007 17-20. 2007.NIMS著者武田 良彦河野 健一郎雨倉 宏岸本 直樹Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:17:03 +0900更新時刻: 2017-03-17 03:16:31 +0900