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Reduction in Oxygen Vacancy Formation Energy Caused by Nitrogen Incorporation in Hf-based High-k Gate Dielectrics

UMEZAWA, Naoto, Kenji Shiraishi , Yasushi Akasaka, Seiji Inumiya, Akira Uedeno , Seiichi Miyazaki , CHIKYOW, Toyohiro, OHNO, Takahisa, Yasuo Nara, Keisaku Yamada .
SISC ABSTRACT 8.3-8.3. 2005.

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    作成時刻 :2017-02-27 00:57:53 +0900 更新時刻 :2017-03-17 02:58:10 +0900

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