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Concentration profiles in silica glass implanted by Zn ions for nanoparticle formation
(SiO2中のイオン注入Znナノ粒子の光学的・熱的特性)

AMEKURA, Hiroshi, Oleg, Plaxine, TAKEDA, Yoshihiko, KONO, Kenichiro, KISHIMOTO, Naoki, Ch. Buchal.
Proc. of 8th Int. Symp. Sputtering & Plasma Processes 216-219. 2005.

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    Created at: 2017-02-27 00:44:53 +0900Updated at: 2017-03-17 02:45:48 +0900

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