FABRICATION OF GRAIN-ALIGNED THICK FILMS OF THERMOELECTRIC OXIDES BY AN ELECTROPHORETIC DEPOSITION METHOD UNDER HIGH MAGNETIC FIELDS | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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FABRICATION OF GRAIN-ALIGNED THICK FILMS OF THERMOELECTRIC OXIDES BY AN ELECTROPHORETIC DEPOSITION METHOD UNDER HIGH MAGNETIC FIELDS

T. Okamoto, S. Horii, T. Kumagai, J. Shimoyama, K. Kishio, UCHIKOSHI, Tetsuo, SUZUKI, Tohru, SAKKA, Yoshio.

Proc. PacRim6 CDR-CDR. 2006.

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作成時刻: 2017-02-27 01:00:04 +0900 更新時刻: 2017-09-06 20:54:36 +0900

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