FABRICATION OF GRAIN-ALIGNED THICK FILMS OF THERMOELECTRIC OXIDES BY AN ELECTROPHORETIC DEPOSITION METHOD UNDER HIGH MAGNETIC FIELDS | SAMURAI, NIMS Researchers Directory Service

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FABRICATION OF GRAIN-ALIGNED THICK FILMS OF THERMOELECTRIC OXIDES BY AN ELECTROPHORETIC DEPOSITION METHOD UNDER HIGH MAGNETIC FIELDS

T. Okamoto, S. Horii, T. Kumagai, J. Shimoyama, K. Kishio, UCHIKOSHI, Tetsuo, SUZUKI, Tohru, SAKKA, Yoshio.

Proc. PacRim6 CDR-CDR. 2006.

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Created at: 2017-02-27 01:00:04 +0900Updated at: 2017-09-06 20:54:36 +0900

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