HOME > 会議録 > 書誌詳細A Novel Remote Reactive Sink Layer Technique for the Control of N and O Concentrations in Metal/High-k Gate StacksYasushi Akasaka, SHIRAISHI, Kenji, UMEZAWA, Naoto, O. Ogata, T. Kasuya, CHIKYOW, Toyohiro, F. Ootsuka, Yasuo Nara, N. Nakamura. 2006 Symposium on VLSI Technology Digest of Technical Papers 3-4. 2006.NIMS著者知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:06:09 +0900更新時刻: 2017-03-17 03:05:58 +0900
