SAMURAI - NIMS Researchers Database

HOME > Proceedings > Detail

A Novel Remote Reactive Sink Layer Technique for the Control of N and O Concentrations in Metal/High-k Gate Stacks

Yasushi Akasaka, SHIRAISHI, Kenji, UMEZAWA, Naoto, O. Ogata, T. Kasuya, CHIKYOW, Toyohiro, F. Ootsuka, Yasuo Nara, N. Nakamura.
2006 Symposium on VLSI Technology Digest of Technical Papers 3-4. 2006.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2017-02-27 01:06:09 +0900Updated at: 2017-03-17 03:05:58 +0900

    ▲ Go to the top of this page