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A Novel Remote Reactive Sink Layer Technique for the Control of N and O Concentrations in Metal/High-k Gate Stacks

Yasushi Akasaka, SHIRAISHI, Kenji, UMEZAWA, Naoto, O. Ogata, T. Kasuya, CHIKYOW, Toyohiro, F. Ootsuka, Yasuo Nara, N. Nakamura.
2006 Symposium on VLSI Technology Digest of Technical Papers 3-4. 2006.

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    Created at: 2017-02-27 01:06:09 +0900 Updated at: 2017-03-17 03:05:58 +0900

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