SAMURAI - NIMS Researchers Database

HOME > Proceedings > Detail

Extensive Studies for the Effect of Nitrogen Incorporation into Hf-based High-k Gate Dielectrics

UMEZAWA, Naoto, SHIRAISHI, Kenji, WATANABE, Heiji, Kazuyoshi, Yasushi Akasaka, Seiji Inumiya, Mauro Boero, Akira Uedono, Seiichi Miyazaki, OHNO, Takahisa, CHIKYOW, Toyohiro, YAMABE, Kikuo, Yasuo Nara, YAMADA, Keisaku.
ECS Transactions 63-78. 2006.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2017-02-27 01:03:29 +0900Updated at: 2017-03-17 03:03:31 +0900

    ▲ Go to the top of this page