HOME > 会議録 > 書誌詳細Extensive Studies for the Effect of Nitrogen Incorporation into Hf-based High-k Gate DielectricsUMEZAWA, Naoto, SHIRAISHI, Kenji, WATANABE, Heiji, Kazuyoshi, Yasushi Akasaka, Seiji Inumiya, Mauro Boero, Akira Uedono, Seiichi Miyazaki, OHNO, Takahisa, CHIKYOW, Toyohiro, YAMABE, Kikuo, Yasuo Nara, YAMADA, Keisaku. ECS Transactions 63-78. 2006.NIMS著者知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:03:29 +0900 更新時刻: 2017-03-17 03:03:31 +0900
