HOME > Presentation > Detail
ゲートラストhigh-k CMOSﾌﾟﾛｾｽにおけるゲート絶縁膜としてのALD-(Ta/Nb)ON膜の開発
(Developments of ALD-(Ta/Nb)ON films as gate insulator for gate-last high-k CMOS process)
13th International Conference on Atomic Layer Deposition. 2013.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:31:25 +0900Updated at: 2017-07-10 21:35:46 +0900