HOME > Presentation > Detail(Bias-application in hard x-ray photoelectron spectroscopy for characterization of advanced materials)山下 良之, 吉川 英樹, 上田 茂典, 知京 豊裕, 小林 啓介. 5th international symposium on practical surface analysis. 2010.NIMS author(s)YAMASHITA, YoshiyukiYOSHIKAWA, HidekiUEDA, ShigenoriCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:21:27 +0900Updated at: 2017-07-10 20:55:13 +0900