HOME > Presentation > Detail(Bias-application in hard x-ray photoelectron spectroscopy for characterization of advanced materials)山下 良之, 吉川 英樹, 上田 茂典, 知京 豊裕, 小林 啓介. 5th international symposium on practical surface analysis. October 03, 2010-October 07, 2010.NIMS author(s)YAMASHITA, YoshiyukiYOSHIKAWA, HidekiUEDA, ShigenoriCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:21:27 +0900Updated at: 2017-07-10 20:55:13 +0900