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Fundamental study on the SiO2 growth mechanism of electronegativity difference of Metal-O in the high-k underlayers by PE-ALD method

MAEDA, Erika, NABATAME, Toshihide, HIROSE, Masafumi, INOUE, Mari, OHI, Akihiko, Makoto Takahashi, IKEDA, Naoki, Kazuhiro Ito, 清野　肇.
ALD2019. 2019.

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Materials Data Repository (MDR)上の本文・データセット

    作成時刻: 2019-10-05 03:00:19 +0900更新時刻: 2019-10-05 03:00:19 +0900

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