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シリコンナノワイヤ中のP原子の熱酸化過程での偏析挙動
(Segregation behavior of phosphorus atoms in silicon nanowires during thermal oxidation)

神永 惇, 滝口亮, 鈴木 慶太郎, 菱田 俊一, 関口 隆史, 村上浩一, 深田 直樹.
第60回応用物理学会春季学術講演会. March 27, 2013-March 30, 2013.

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    Created at: 2017-02-14 11:45:21 +0900 Updated at: 2017-07-10 22:22:12 +0900

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