HOME > 口頭発表 > 書誌詳細First-Principles Study on the mechanism of Halogen atom diffusion on Si(111) surface奈良 純, 浅利 裕介, 大野 隆央. 10th International Conference on Atomically Controlled Surfaces. 2009.NIMS著者奈良 純Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-01-08 03:35:10 +0900更新時刻: 2017-07-10 20:37:30 +0900