HOME > Presentation > DetailFirst-Principles Study on the mechanism of Halogen atom diffusion on Si(111) surface奈良 純, 浅利 裕介, 大野 隆央. 10th International Conference on Atomically Controlled Surfaces. 2009.NIMS author(s)NARA, JunOHNO, TakahisaFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-01-08 03:35:10 +0900 Updated at :2017-07-10 20:37:30 +0900