HOME > Presentation > Detail(Bias-application in hard x-ray photoelectron spectroscopy for characterization of advanced materials)山下 良之, 大毛利 健治, 上田 茂典, 吉川 英樹, 知京 豊裕, 小林 啓介. European Conference on Surface Science 26. 2009.NIMS author(s)YAMASHITA, YoshiyukiUEDA, ShigenoriYOSHIKAWA, HidekiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:16:43 +0900Updated at: 2017-07-10 20:34:02 +0900