HOME > Presentation > Detail(Bias-application in hard x-ray photoelectron spectroscopy for characterization of advanced materials)山下 良之, 大毛利 健治, 上田 茂典, 吉川 英樹, 知京 豊裕, 小林 啓介. European Conference on Surface Science 26. August 30, 2009-September 04, 2009.NIMS author(s)YAMASHITA, YoshiyukiUEDA, ShigenoriYOSHIKAWA, HidekiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:16:43 +0900 Updated at: 2017-07-10 20:34:02 +0900